Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/54929
Type: Artigo de periódico
Title: a-SiOx < Er > active photonic crystal resonator membrane fabricated by focused Ga+ ion beam
Author: Figueira, DSL
Barea, LAM
Vallini, F
Jarschel, PF
Lang, R
Frateschi, NC
Abstract: We have fabricated thin erbium-doped amorphous silicon suboxide (a-SiOx < Er >) photonic crystal membrane using focused gallium ion beam (FIB). The photonic crystal is composed of a hexagonal lattice with a H1 defect supporting two quasi-doubly degenerate second order dipole states. 2-D simulation was used for the design of the structure and full 3-D FDTD (Finite-Difference Time-Domain) numerical simulations were performed for a complete analysis of the structure. The simulation predicted a quality factor for the structure of Q = 350 with a spontaneous emission enhancement of 7. Micro photoluminescence measurements showed an integrated emission intensity enhancement of similar to 2 times with a Q = 130. We show that the discrepancy between simulation and measurement is due to the conical shape of the photonic crystal holes and the optical losses induced by FIB milling. (C)2012 Optical Society of America
Country: EUA
Editor: Optical Soc Amer
Rights: aberto
Date Issue: 2012
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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