Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/54243
Type: Artigo de periódico
Title: Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF6 plasma
Author: Alves, MAR
Porto, LF
de Faria, PHL
Braga, ES
Abstract: A room temperature fabrication process for silicon microtips has been developed using amorphous hydrogenated carbon films as masks for silicon etching. Reactive ion etching using an SF6 plasma has been employed to sharpen the microtips without any thermal oxidation technique. (C) 2003 Elsevier Ltd. All rights reserved.
Subject: silicon microtips
hydrogenated carbon films
SF6 plasma
Country: Inglaterra
Editor: Pergamon-elsevier Science Ltd
Rights: fechado
Identifier DOI: 10.1016/j.vacuum.2003.10.012
Date Issue: 2004
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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