Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/53651
Type: Artigo de periódico
Title: A QUANTITATIVE STUDY OF CHEMICAL ETCHING OF INP
Author: DASNEVES, S
DEPAOLI, MA
Abstract: Chemical etching of InP with HCl is used on a large scale, but limited information is available in the literature on the quantitative and mechanistic aspects of this reaction, A higher reaction rate is observed in alcoholic HCl than in aqueous HCl solutions. Also, a decrease of the reaction rate is observed with an increase in the degree of dissociation of HCl in aqueous solutions. We confirm that chemical etching depends on the concentration of nondissociated HCl molecules and that the reaction does not occur below a critical concentration. A first-order rate was obtained in aqueous and in alcoholic HCl solutions. The Arrhenius plot indicated an activation energy greater than 40 kJ . mol-1, indicating a kinetically controlled process. Scanning electron microscopy also showed profiles characteristic of a kinetically controlled process.
Editor: Electrochemical Soc Inc
Rights: aberto
Identifier DOI: 10.1149/1.2220869
Date Issue: 1993
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

Files in This Item:
File Description SizeFormat 
WOSA1993LX30200034.pdf1.03 MBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.