Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/53030
Type: Artigo de periódico
Title: A contribution of vibrationally excited Cl-2 molecules to GaAs reactive ion etching in Cl-2/Ar
Author: Moshkalyov, SA
Machida, M
Lebedev, SV
Campos, DO
Abstract: The experimental results on GaAs RIE in Cl-2/Ar are considered within the framework of the ion-neutral synergy model. It has been shown, that the model gives a good agreement with the etch rate data obtained for low Cl-2 partial pressure, but fails at the increased chlorine percentage. A possible contribution of vibrationally excited Cl-2 molecules to GaAs etch rate has been considered.
Subject: reactive ion etching
GaAs
etching model
Cl-2
excited molecules
Country: Japão
Editor: Japan J Applied Physics
Rights: fechado
Date Issue: 1996
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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