Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/52847
Type: Artigo de periódico
Title: LOW-TEMPERATURE CHEMICAL-VAPOR-DEPOSITION OF DIAMOND ON TUNGSTEN CARBIDES USING CF4 GAS DOPING FOR MACHINE-TOOL APPLICATIONS
Author: TRAVAAIROLDI, VJ
NOBREGA, BN
CORAT, EJ
DELBOSCO, E
LEITE, NF
BARANAUSKAS, V
Abstract: We report here the improvement of the adhesion of CVD diamond films on WC- Co (6%) tools and the enhancement in the cutting tool life- time by the introduction of CF4 in the CH4/H-2 gas mixture. By the use of this halogen precursor it was possible to reduce the substrate temperature during the deposition without degradation in the diamond film quality. The low-temperature deposition improves the smoothness of the coating and minimizes the thermal stress induced by the CVD process.
Country: Inglaterra
Editor: Pergamon-elsevier Science Ltd
Rights: fechado
Identifier DOI: 10.1016/0042-207X(95)80050-6
Date Issue: 1995
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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