Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/52843
Type: Artigo de periódico
Title: Low-roughness active microdisk resonators fabricated by focused ion beam
Author: Barea, LAM
Vallini, F
Vaz, AR
Mialichi, JR
Frateschi, NC
Abstract: The authors present a new approach for the fabrication of active microdisk resonators using focused ion beam (FIB) followed by selective wet-chemical etching. This efficient technique enables the placement of the devices at any region of a sample and facilitates prototyping of monolithical integration. Also, it allows the production of very smooth walls required by the resonators. High-quality resonators with an active region based on high-gain InGaAsP/InP quantum wells are demonstrated using this technique. Emission in the C-band at whispering-gallery modes is observed.
Subject: etching
focused ion beam technology
gallium arsenide
gallium compounds
III-V semiconductors
indium compounds
integrated optics
microcavities
micro-optics
optical fabrication
optical resonators
semiconductor quantum wells
whispering gallery modes
Country: EUA
Editor: A V S Amer Inst Physics
Rights: aberto
Identifier DOI: 10.1116/1.3264481
Date Issue: 2009
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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