Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/349091
Type: Artigo
Title: Copper removal kinetic from electroplating industry wastewater using pulsed electrodeposition technique
Author: Nepel, Thayane Carpanedo de Morais
Costa, Josiel Martins
Vieira, Melissa Gurgel Adeodato
de Almeida Neto, Ambrosio Florencio
Abstract: This study presents a kinetic determination of copper removal from a real jewelry industry wastewater, with removal reaching 82.49% at 37 degrees C, using fast galvanic pulse electrochemical technique in a process lasting 115 min. In the temperature range from 20 to 40 degrees C, the mathematical model of the pseudo-first-order irreversible rate equation, with a correlation coefficient of 0.99, described the process behaviour. In this same temperature range, the Arrhenius' equation described the system, in which the temperature increase favoured the reaction kinetics. The scanning electron microscope (SEM), with energy-dispersive X-ray detector (EDX), X-ray photoelectron spectroscopy (XPS) results, and the mathematical model fitting at the temperatures of 10 and 50 degrees C indicated the formation of copper oxide I
Subject: Metais - Reaproveitamento
Country: Reino Unido
Editor: Taylor & Francis
Rights: Fechado
Identifier DOI: 10.1080/09593330.2020.1793005
Address: https://www.tandfonline.com/doi/full/10.1080/09593330.2020.1793005
Date Issue: Jul-2020
Appears in Collections:FEQ - Artigos e Outros Documentos

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