Please use this identifier to cite or link to this item:
Type: Artigo
Title: Abatement and toxicity reduction of antimicrobials by UV/H2O2 process
Author: Urbano, Vanessa Ribeiro
Peres, Marcela Souza
Maniero, Milena Guedes
Guimarães, José Roberto
Abstract: Antimicrobials are continuously detected in environmental waters and their removal is important to avoid health and microorganisms damage. In this work, the peroxidation assisted by ultraviolet radiation (UV/H2O2) was studied to verify if the process was able to degrade sulfaquinoxaline and ofloxacin antimicrobials and to remove the toxicity and the antimicrobial activity of the solution. This process was effective on degradation of the antimicrobials, despite the antimicrobial activity removal, the toxicity of the solution increased throughout the reaction time
Subject: Atividade antimicrobiana
Processo oxidativo avançado
Country: Reino Unido
Editor: Elsevier
Rights: Fechado
Identifier DOI: 10.1016/j.jenvman.2017.02.028
Date Issue: 2017
Appears in Collections:FEC - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
000397687100044.pdf2.09 MBAdobe PDFView/Open

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.