Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/345883
Type: Artigo
Title: The surface texturing of monocrystalline silicon with NH4OH and ion implantation for applications in solar cells compatible with CMOS technology
Author: Silva, A. R.
Miyoshi, J,
Diniz, J. A.
Doi, I.
Godoy, J.
Abstract: This work presents the development of photovoltaic cells based on p+/n junction in Si substrates, aimed at compatibility with fabrication processes with CMOS technology. The compatible processes, which are developed in this study, are the techniques: i) Si surface texturing, with the textured surface reflection of 15% obtained by the formation of micro-pyramids (heights between 3 and 7 μm) using NH4OH (ammonium hydroxide) alkaline solution, which is free of undesirable contamination by Na+ and K+ ions, when NaOH and KOH traditional solutions are used, respectively, and ii) of the ECR-CVD (Electron Cyclotron Resonance - Chemical Vapor Deposition) deposition of SiNx (silicon nitride) anti-reflective coating (ARC), which is carried out at room temperature and can be performed after the end of cell fabrication without damage on metallic tracks and without variation of p+/n junction depth. The ARC coating characterization presented that the silicon nitride has a refractive index of 1.92 and a minimum reflectance of 1.03%, which is an excellent result for application in solar (or photovoltaic) cells. For the formation of the pn junction was used ion implantation process with 11B+, E=20 KeV, dose of 1x1015 cm2 and four rotations of 90° to get uniformity on texturized surfaces
Subject: Camada antirrefletora
Células solares
Implantação iônica
Semicondutores complementares de óxido metálico
Country: Países Baixos
Editor: Elsevier
Rights: Aberto
Identifier DOI: 10.1016/j.egypro.2013.12.019
Address: https://www.sciencedirect.com/science/article/pii/S1876610213018328
Date Issue: 2014
Appears in Collections:FEEC - Artigos e Outros Documentos

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