Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/345857
Type: Artigo
Title: Ga+ focused ion beam lithography as a viable alternative for multiple fin field effect transistor prototyping
Author: Leonhardt, Alessandra
Santos, Marcos Vinicius Puydinger dos
Diniz, José Alexandre
Manera, Leandro Tiago
Lima, Lucas Petersen Barbosa
Abstract: A novel method for fast and flexible fin field effect transistor (FinFET) prototyping using a Ga+ focused ion beam is presented. The fin width and height control is explored, aiming for the successful fabrication of prototypes. This method results in fins with negligible Ga incorporation, when compared to traditional focused ion beam milling techniques. Our method for multiple fin FinFET prototyping enables advanced device fabrication and great flexibility regarding both the number of fins and fin width. Working FinFET prototypes have been fabricated using the proposed fin definition method, and the electrical characterization is discussed
Subject: Nanofabricação
Country: Estados Unidos
Editor: AIP Publishing
Rights: Aberto
Identifier DOI: 10.1116/1.4963879
Address: https://avs.scitation.org/doi/10.1116/1.4963879
Date Issue: 2016
Appears in Collections:FEEC - Artigos e Outros Documentos

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