Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/329810
Type: Artigo
Title: Abatement And Toxicity Reduction Of Antimicrobials By Uv/h2o2 Process
Author: Urbano
Vanessa Ribeiro; Peres
Marcela Souza; Maniero
Milena Guedes; Guimaraes
Jose Roberto
Abstract: Antimicrobials are continuously detected in environmental waters and their removal is important to avoid health and microorganisms damage. In this work, the peroxidation assisted by ultraviolet radiation (UV/H2O2) was studied to verify if the process was able to degrade sulfaquinoxaline and ofloxacin antimicrobials and to remove the toxicity and the antimicrobial activity of the solution. This process was effective on degradation of the antimicrobials, despite the antimicrobial activity removal, the toxicity of the solution increased throughout the reaction time. (C) 2017 Elsevier Ltd. All rights reserved.
Subject: Advanced Oxidation Process
Antimicrobial Activity
Ofloxacin
Peroxidation
Photolysis
Sulfaquinoxaline
Editor: Academic Press LTD - Elsevier Science LTD
London
Rights: fechado
Identifier DOI: 10.1016/j.jenvman.2017.02.028
Address: http://www.sciencedirect.com/science/article/pii/S0301479717301366?via%3Dihub
Date Issue: 2017
Appears in Collections:Unicamp - Artigos e Outros Documentos

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