Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/328555
Type: Artigo
Title: Annealing-based Electrical Tuning Of Cobalt-carbon Deposits Grown By Focused-electron-beam-induced Deposition
Annealing-based electrical tuning of cobalt-carbon deposits grown by focused-electron-beam-induced deposition
Author: Santos, M. V. P. dos
Velo, M. F.
Domingos, R. D.
Zhang, Y. C.
Maeder, X.
Guerra-Nuñez, C.
Best, J. P.
Béron, F.
Pirota, K. R.
Moshkalev, S.
Diniz, J. A.
Utket, I.
Abstract: An effective postgrowth electrical tuning, via an oxygen releasing method, to enhance the content of non-noble metals in deposits directly written with gas-assisted focused-electron-beam-induced deposition (FebID) is presented. It represents a novel and reproducible method for improving the electrical transport properties of Co-C deposits. The metal content and electrical properties of Co-C-O nanodeposits obtained by electron-induced dissociation of volatile Co-2(CO)(8) precursor adsorbate molecules were reproducibly tuned by applying postgrowth annealing processes at 100 degrees C, 200 degrees C, and 300 degrees C under high-vacuum for 10 min. Advanced thin film EDX analysis showed that during the annealing process predominantly oxygen is released from the Co-C-O deposits, yielding an atomic ratio of Co:C:O = 100:16:1 (85:14:1) with respect to the atomic composition of as written Co:C:O = 100:21:28 (67:14:19). In-depth Raman analysis suggests that the amorphous carbon contained in the as-written deposit turns into graphite nanocrystals with size of about 22.4 nm with annealing temperature. Remarkably, these microstructural changes allow for tuning of the electrical resistivity of the deposits over 3 orders of magnitude from 26 m Omega cm down to 26 mu Omega cm, achieving a residual resistivity of rho(2K)/rho(300 K) = 0.56, close to the value of 0.53 for pure Co films with similar dimensions, making it especially interesting and advantageous over the numerous works already published for applications such as advanced scanning-probe systems, magnetic memory, storage, and ferroelectric tunnel junction memristors, as the graphitic matrix protects the cobalt from being oxidized under an ambient atmosphere.
An effective postgrowth electrical tuning, via an oxygen releasing method, to enhance the content of non-noble metals in deposits directly written with gas-assisted focused-electron-beam-induced deposition (FebID) is presented. It represents a novel and reproducible method for improving the electrical transport properties of Co-C deposits. The metal content and electrical properties of Co-C-O nanodeposits obtained by electron-induced dissociation of volatile Co-2(CO)(8) precursor adsorbate molecules were reproducibly tuned by applying postgrowth annealing processes at 100 degrees C, 200 degrees C, and 300 degrees C under high-vacuum for 10 min. Advanced thin film EDX analysis showed that during the annealing process predominantly oxygen is released from the Co-C-O deposits, yielding an atomic ratio of Co:C:O = 100:16:1 (85:14:1) with respect to the atomic composition of as written Co:C:O = 100:21:28 (67:14:19). In-depth Raman analysis suggests that the amorphous carbon contained in the as-written deposit turns into graphite nanocrystals with size of about 22.4 nm with annealing temperature. Remarkably, these microstructural changes allow for tuning of the electrical resistivity of the deposits over 3 orders of magnitude from 26 m Omega cm down to 26 mu Omega cm, achieving a residual resistivity of rho(2K)/rho(300 K) = 0.56, close to the value of 0.53 for pure Co films with similar dimensions, making it especially interesting and advantageous over the numerous works already published for applications such as advanced scanning-probe systems, magnetic memory, storage, and ferroelectric tunnel junction memristors, as the graphitic matrix protects the cobalt from being oxidized under an ambient atmosphere.
Subject: Focused-electron-beam-induced Deposition
Cobalt
Nanofabrication
Thermally Induced Oxygen Tuning
Thermally Induced Graphitization
Cobalto, Nanofabricação, Feixes de elétrons
Country: Estados Unidos
Editor: American Chemical Society
Citation: Acs Applied Materials & Interfaces. Amer Chemical Soc, v. 8, p. 32496 - 32503, 2016.
Rights: fechado
Identifier DOI: 10.1021/acsami.6b12192
Address: http://pubs.acs.org/doi/abs/10.1021/acsami.6b12192
Date Issue: 2016
Appears in Collections:IFGW - Artigos e Outros Documentos
FEEC - Artigos e Outros Documentos
CCSNano - Artigos e Outros Documentos

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