Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/328375
Type: Artigo
Title: Solid-vapor reaction growth of transition-metal dichalcogenide monolayers
Author: Li, B.
Gong, Y.
Hu, Z. L.
Brunetto, G.
Yang, Y.
Ye, G.
Zhang, Z.
Lei, S.
Jin, Z.
Bianco, E.
Zhang, X.
Wang, W.
Lou, J.
Galvão, D. S.
Tang, M.
Yakobson, B. I.
Vajtai, R.
Ajayan, P. M.
Abstract: Two-dimensional (2D) layered semiconducting transition-metal dichalcogenides (TMDCs) are promising candidates for next-generation ultrathin, flexible, and transparent electronics. Chemical vapor deposition (CVD) is a promising method for their controllable, scalable synthesis but the growth mechanism is poorly understood. Herein, we present systematic studies to understand the CVD growth mechanism of monolayer MoSe2, showing reaction pathways for growth from solid and vapor precursors. Examination of metastable nanoparticles deposited on the substrate during growth shows intermediate growth stages and conversion of non-stoichiometric nanoparticles into stoichiometric 2D MoSe2 monolayers. The growth steps involve the evaporation and reduction of MoO3 solid precursors to sub-oxides and stepwise reactions with Se vapor to finally form MoSe2. The experimental results and proposed model were corroborated by abinitio Car-Parrinello molecular dynamics studies.
Subject: Deposição química de vapor
Monocamadas auto-organizadas
Dicalcogenetos de metais de transição
Country: Alemanha
Editor: Wiley-VCH Verlag
Citation: Angewandte Chemie International Edition. Wiley-v C H Verlag Gmbh, v. 55, p. 10656 - 10661, 2016.
Rights: fechado
Identifier DOI: 10.1002/anie.201604445
Address: https://onlinelibrary.wiley.com/doi/full/10.1002/anie.201604445
Date Issue: 2016
Appears in Collections:IFGW - Artigos e Outros Documentos

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