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http://repositorio.unicamp.br/jspui/handle/REPOSIP/242873
Type: | Artigo |
Title: | Burning graphene layer-by-layer |
Author: | Ermakov, Victor A. Alaferdov, Andrei V. Vaz, Alfredo R. Perim, Eric Autreto, Pedro A. S. Paupitz, Ricardo Galvão, Douglas S. Moshkalev, Stanislav A. |
Abstract: | Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in "cold-wall" reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material. Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in "cold-wall" reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material. |
Subject: | Grafeno Filmes multicamadas Oxidação |
Country: | Reino Unido |
Editor: | Nature Publishing Group |
Citation: | Burning Graphene Layer-by-layer. Nature Publishing Group, v. 5, p. Jun-2015. |
Rights: | aberto |
Identifier DOI: | 10.1038/srep11546 |
Address: | http://www.nature.com/articles/srep11546 |
Date Issue: | 2015 |
Appears in Collections: | IFGW - Artigos e Outros Documentos CCSNano - Artigos e Outros Documentos |
Files in This Item:
File | Size | Format | |
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000356663700001.pdf | 3.77 MB | Adobe PDF | View/Open |
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