Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/237989
Type: Artigo
Title: Anomalous temperature behavior of resistance in C1-xCOx thin films grown by pulsed laser deposition technique
Author: Sergeenkov, S.
Córdova, C.
Cichetto Jr., L.
Lima, O. F. de
Longo, E.
Araújo-Moreira, F. M.
Abstract: We study the transport properties of C1-xCox thin films (with x = 0.1, 0.15 and 0.2) grown on Si substrate by pulsed laser deposition technique. The results demonstrate some anomalous effects in the behavior of the measured resistance R(T,x). More specifically, for 0 < T < T∗ range (with T∗ ≃ 220 K), the resistance is shown to be well fitted by a small polaron hopping scenario with Rh(T,x)∝exp(Formula presented.) and a characteristic temperature T0(x)≃T0(0)(1-x) (with T0(0) = 120 K). While for higher temperatures T∗ < T < TC(x), the resistance is found to be linearly dependent on spontaneous magnetization M(T,x), viz. RM(T,x)∝M(T,x), following the pattern dictated by electron scattering on cobalt atoms formed robust ferromagnetic structure with the Curie temperature TC(x) obeying a percolation like law TC(x)≃TC(xm)(x/xm)0.15 with TC(xm) = 295 K and the maximum zero-temperature magnetization reaching M(0,xm)≃0.5μB per Co atom for xm = 0.2. © 2016 Elsevier B.V. All rights reserved.
We study the transport properties of C1-xCox thin films (with x = 0.1, 0.15 and 0.2) grown on Si substrate by pulsed laser deposition technique. The results demonstrate some anomalous effects in the behavior of the measured resistance R(T,x). More specifically, for 0 &lt, T &lt, T∗ range (with T∗ ≃ 220 K), the resistance is shown to be well fitted by a small polaron hopping scenario with Rh(T,x)∝exp(Formula presented.) and a characteristic temperature T0(x)≃T0(0)(1-x) (with T0(0) = 120 K). While for higher temperatures T∗ &lt, T &lt, TC(x), the resistance is found to be linearly dependent on spontaneous magnetization M(T,x), viz. RM(T,x)∝M(T,x), following the pattern dictated by electron scattering on cobalt atoms formed robust ferromagnetic structure with the Curie temperature TC(x) obeying a percolation like law TC(x)≃TC(xm)(x/xm)0.15 with TC(xm) = 295 K and the maximum zero-temperature magnetization reaching M(0,xm)≃0.5μB per Co atom for xm = 0.2.
Subject: Carbono, Cobalto, Nanocompósitos (Materiais), Filmes finos, Resistência
Country: Holanda
Editor: Elsevier
Citation: Journal Of Alloys And Compounds. Elsevier Ltd, v. 667, p. 18 - 22, 2016.
Rights: fechado
Identifier DOI: 10.1016/j.jallcom.2016.01.141
Address: https://www.sciencedirect.com/science/article/pii/S0925838816301426
Date Issue: 2016
Appears in Collections:IFGW - Artigos e Outros Documentos

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