Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/235685
Type: Artigo de periódico
Title: Burning Graphene Layer-by-layer.
Author: Ermakov, Victor A
Alaferdov, Andrei V
Vaz, Alfredo R
Perim, Eric
Autreto, Pedro A S
Paupitz, Ricardo
Galvao, Douglas S
Moshkalev, Stanislav A
Abstract: Graphene, in single layer or multi-layer forms, holds great promise for future electronics and high-temperature applications. Resistance to oxidation, an important property for high-temperature applications, has not yet been extensively investigated. Controlled thinning of multi-layer graphene (MLG), e.g., by plasma or laser processing is another challenge, since the existing methods produce non-uniform thinning or introduce undesirable defects in the basal plane. We report here that heating to extremely high temperatures (exceeding 2000 K) and controllable layer-by-layer burning (thinning) can be achieved by low-power laser processing of suspended high-quality MLG in air in cold-wall reactor configuration. In contrast, localized laser heating of supported samples results in non-uniform graphene burning at much higher rates. Fully atomistic molecular dynamics simulations were also performed to reveal details of oxidation mechanisms leading to uniform layer-by-layer graphene gasification. The extraordinary resistance of MLG to oxidation paves the way to novel high-temperature applications as continuum light source or scaffolding material.
Citation: Scientific Reports. v. 5, p. 11546, 2015.
Rights: aberto
Identifier DOI: 10.1038/srep11546
Address: http://www.ncbi.nlm.nih.gov/pubmed/26100466
Date Issue: 2015
Appears in Collections:Unicamp - Artigos e Outros Documentos

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