Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/200945
Type: Artigo de periódico
Title: Note: An Ion Source For Alkali Metal Implantation Beneath Graphene And Hexagonal Boron Nitride Monolayers On Transition Metals.
Author: de Lima, L H
Cun, H Y
Hemmi, A
Kälin, T
Greber, T
Abstract: The construction of an alkali-metal ion source is presented. It allows the acceleration of rubidium ions to an energy that enables the penetration through monolayers of graphene and hexagonal boron nitride. Rb atoms are sublimated from an alkali-metal dispenser. The ionization is obtained by surface ionization and desorption from a hot high work function surface. The ion current is easily controlled by the temperature of ionizer. Scanning Tunneling Microscopy measurements confirm ion implantation.
Rights: aberto
Identifier DOI: 10.1063/1.4848936
Address: http://www.ncbi.nlm.nih.gov/pubmed/24387480
Date Issue: 2013
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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