Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/200689
Type: Artigo de periódico
Title: Stress Distribution In Co-cr Implant Frameworks After Laser Or Tig Welding.
Author: de Castro, Gabriela Cassaro
de Araújo, Cleudmar Amaral
Mesquita, Marcelo Ferraz
Consani, Rafael Leonardo Xediek
Nóbilo, Mauro Antônio de Arruda
Abstract: Lack of passivity has been associated with biomechanical problems in implant-supported prosthesis. The aim of this study was to evaluate the passivity of three techniques to fabricate an implant framework from a Co-Cr alloy by photoelasticity. The model was obtained from a steel die simulating an edentulous mandible with 4 external hexagon analog implants with a standard platform. On this model, five frameworks were fabricated for each group: a monoblock framework (control), laser and TIG welding frameworks. The photoelastic model was made from a flexible epoxy resin. On the photoelastic analysis, the frameworks were bolted onto the model for the verification of maximum shear stress at 34 selected points around the implants and 5 points in the middle of the model. The stresses were compared all over the photoelastic model, between the right, left, and center regions and between the cervical and apical regions. The values were subjected to two-way ANOVA, and Tukey's test (α=0.05). There was no significant difference among the groups and studied areas (p>0.05). It was concluded that the stresses generated around the implants were similar for all techniques.
Subject: Chromium Alloys
Dental Casting Technique
Dental Implant-abutment Design
Dental Implants
Dental Models
Dental Prosthesis, Implant-supported
Dental Soldering
Epoxy Resins
Humans
Jaw, Edentulous
Lasers
Mandible
Materials Testing
Plasma Gases
Stress, Mechanical
Surface Properties
Welding
Rights: fechado
Identifier DOI: 10.1590/0103-6440201302112
Address: http://www.ncbi.nlm.nih.gov/pubmed/23780359
Date Issue: 2013
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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