Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/200225
Type: Artigo de periódico
Title: A-siox<er> Active Photonic Crystal Resonator Membrane Fabricated By Focused Ga+ Ion Beam.
Author: Figueira, David S L
Barea, Luis A M
Vallini, Felipe
Jarschel, Paulo F
Lang, Rossano
Frateschi, Newton C
Abstract: We have fabricated thin erbium-doped amorphous silicon sub-oxide (a-SiOx<Er>) photonic crystal membrane using focused gallium ion beam (FIB). The photonic crystal is composed of a hexagonal lattice with a H1 defect supporting two quasi-doubly degenerate second order dipole states. 2-D simulation was used for the design of the structure and full 3-D FDTD (Finite-Difference Time-Domain) numerical simulations were performed for a complete analysis of the structure. The simulation predicted a quality factor for the structure of Q = 350 with a spontaneous emission enhancement of 7. Micro photoluminescence measurements showed an integrated emission intensity enhancement of ~2 times with a Q = 130. We show that the discrepancy between simulation and measurement is due to the conical shape of the photonic crystal holes and the optical losses induced by FIB milling.
Subject: Crystallization
Gallium
Heavy Ions
Materials Testing
Membranes, Artificial
Silicon Dioxide
Transducers
Rights: fechado
Identifier DOI: 
Address: http://www.ncbi.nlm.nih.gov/pubmed/23038517
Date Issue: 2012
Appears in Collections:Artigos e Materiais de Revistas Científicas - Unicamp

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