Please use this identifier to cite or link to this item:
|Type:||Artigo de periódico|
|Title:||Diffractive phase-shift lithography photomask operating in proximity printing mode|
|Author:||CIRINO, Giuseppe A.|
MANSANO, Ronaldo D.
NETO, Luiz G.
|Abstract:||A phase shift proximity printing lithographic mask is designed, manufactured and tested. Its design is based on a Fresnel computer-generated hologram, employing the scalar diffraction theory. The obtained amplitude and phase distributions were mapped into discrete levels. In addition, a coding scheme using sub-cells structure was employed in order to increase the number of discrete levels, thus increasing the degree of freedom in the resulting mask. The mask is fabricated on a fused silica substrate and an amorphous hydrogenated carbon (a:C-H) thin film which act as amplitude modulation agent. The lithographic image is projected onto a resist coated silicon wafer, placed at a distance of 50 mu m behind the mask. The results show a improvement of the achieved resolution - linewidth as good as 1.5 mu m - what is impossible to obtain with traditional binary masks in proximity printing mode. Such achieved dimensions can be used in the fabrication of MEMS and MOEMS devices. These results are obtained with a UV laser but also with a small arc lamp light source exploring the partial coherence of this source. (C) 2010 Optical Society of America|
|Editor:||OPTICAL SOC AMER|
|Citation:||OPTICS EXPRESS, v.18, n.16, p.16387-16405, 2010|
|Appears in Collections:||IFGW - Artigos e Materiais de Revistas Científicas|
Files in This Item:
|art_CIRINO_Diffractive_phase-shift_lithography_photomask_operating_in_proximity_2010.pdf||published version||1.89 MB||Adobe PDF||View/Open|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.