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|Type:||Artigo de periódico|
|Title:||Radiation Immobilization Of Poly(methyloctylsiloxane) On Silica For Use In Hplc: A Uniform Layer Model.|
|Author:||Jardim, I C|
Collins, K E
Anazawa, T A
|Abstract:||Poly(methyloctylsiloxane) (PMOS) was sorbed into the pores of HPLC silica by a solvent evaporation procedure, then irradiated with gamma rays from a cobalt-60 source to absorbed doses in the range from 0 to 200 kGy (1Gy = 1J kg-1). Non-irradiated and irradiated samples were characterized by solvent extraction, specific surface area determination, infrared spectroscopy and reversed-phase column performance. Solvent extraction data reveal that about 40% of the PMOS is not extractable prior to irradiation and this increases to about 75% with radiation doses of 50 kGy or higher. Column performance was improved by the radiation treatment, reaching a maximum efficiency in the dose range of 80-140 kGy while the peak symmetry changed from As = 1.7 to 1.1. The improvement is attributed to the increased mass of polymer immobilized by the radiation treatment and to a more uniform distribution of the immobilized polymer in the silica pore system. A multi-layer stationary-phase model is presented in which the first layer consists of an adsorbed monolayer of PMOS and the second layer is immobilized by gamma radiation.|
|Subject:||Chromatography, High Pressure Liquid|
|Appears in Collections:||Artigos e Materiais de Revistas Científicas - Unicamp|
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