Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/107183
Type: Artigo de periódico
Title: Sensitization Of Niobium Pentoxide Thin Films By Cis-dithiocyanate (2,2-bipyridyl-4,4′dicarboxylic Acid) Ruthenium(ii) Complex
Author: Barros Filho D.D.A.
Abreu Filho P.P.
Alves O.L.
Franco D.W.
Abstract: The sensitization caused by the adsorption of a ruthenium complex in a niobium thin film (d < 300 nm) was analysed by photoelectrochemical measurements. The films were coated on a indium-tin-oxide (ITO) conductor glass by a dip-coating technique. The non-sensitized film had only photoelectrochemical current in the UV region (i ≤ 40 nA). The sensitization of the film by cis-dithiocyanate (2,2-bipyridyl-4,4′dicarboxylic acid) ruthenium(II) complex altered the shape of the non-normalized action spectrum with the presence of photoelectrochemical current in the visible range (λ ≥ 400 nm). This photoelectrochemical current (i ≤ 70 nA) was associated with electron injection into the niobium pentoxide conduction band due to metal-to-ligand charge-transfer (MLCT) of the ruthenium complex. The shape of the action spectrum in the UV range (λ ≤ 400 nm) changed with the application of an electric potential to the film surface and the photoelectrochemical current associated with the ligand-to-ligand-to-metal charge transfer of niobia film decreased for higher ruthenium concentration.
Editor: Kluwer Academic Publishers, Dordrecht, Netherlands
Rights: fechado
Identifier DOI: 10.1023/A:1008752124254
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0034240693&partnerID=40&md5=2f449bd0c55121115b760f4919923c7d
Date Issue: 2000
Appears in Collections:Unicamp - Artigos e Outros Documentos

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