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|Type:||Artigo de evento|
|Title:||Photoresist Absorption Effect In Holographic Recording|
|Abstract:||In this paper we compare the photoresist profile of holographic gratings recorded using two different wavelengths λ =458 nm and λ = 407nm. We show that the use of the wavelength λ = 458nm allows the recording of very deep structures (aspect ratios of > 3) because, for photoresist films up to 1 μm of thickness, the absorption is negligible. By the other side, for the wavelength λ = 407nm the absorption coefficient increases by a factor 5. This effect reduces the inclination of lateral walls of the structures as well as disturbs our fringe locker system that uses the residual real time modulation of the refractive index of the photoresist to monitor the fringe perturbation. © 2008 American Institute of Physics.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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