Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/104786
Type: Artigo de periódico
Title: Structural And Electronic Analysis Of Hf On Si(1 1 1) Surface Studied By Xps, Leed And Xpd
Author: Carazzolle M.F.
Schurmann M.
Fluchter C.R.
Weier D.
Berges U.
de Siervo A.
Landers R.
Kleiman G.G.
Westphal C.
Abstract: In this work, we present a systematic electronic and structural study of the Hf-silicide formation upon annealing on Si(1 1 1) surface. The electronic structure and surface composition were determined by X-ray photoelectron spectroscopy (XPS) and angle-resolved X-ray photoelectron spectroscopy (ARXPS). To determine the atomic structure of the surface alloy we used low energy electron diffraction (LEED) and angle-resolved photoelectron diffraction (XPD). It was possible to verify that, after 600 °C annealing, there is alloy formation and after 700 °C the Hf diffusion process is predominant. Using LEED and XPD measurements we detected the ordered island formation simultaneously with alloy formation. © 2007 Elsevier B.V. All rights reserved.
Editor: 
Rights: fechado
Identifier DOI: 10.1016/j.elspec.2006.12.062
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-34247388519&partnerID=40&md5=120055f11f65cd9be441671feb771e4c
Date Issue: 2007
Appears in Collections:Unicamp - Artigos e Outros Documentos

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