Please use this identifier to cite or link to this item:
Type: Artigo de periódico
Title: Oxygen Plasma Etching Of Carbon Nano-structures Containing Nitrogen
Author: Acuna J.J.S.
Figueroa C.A.
Maia da Costa M.E.H.
Paredez P.
Ribeiro C.T.M.
Alvarez F.
Abstract: In this paper we report a study of the oxygen plasma etching effect on CN x nano-structures grown on tiny nickel islands (∼1-5 nm) previously deposited onto oxidized silicon wafers. In order to eliminate the ill-formed structures, broad oxygen ion beam plasma was used to irradiate the nano-structured CN x material (∼3.4 at.% N). The structures were prepared by ion beam assisted deposition (IBAD) and etched in situ by an oxygen ion beam at room temperature. In situ characterization by XPS and ex situ Raman, FEG-SEM, AFM, and field emission measurements were employed to study the evolution of the nano-structures. Raman spectra show two narrow and well defined D and G bands (disorder and graphitic bands) in the formed nano-structure. © 2006 Elsevier B.V. All rights reserved.
Rights: fechado
Identifier DOI: 10.1016/j.jnoncrysol.2005.10.027
Date Issue: 2006
Appears in Collections:Unicamp - Artigos e Outros Documentos

Files in This Item:
File Description SizeFormat 
2-s2.0-33744528007.pdf216.24 kBAdobe PDFView/Open

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.