Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/101379
Type: Artigo de evento
Title: Thermal Expansion Coefficient Of Amorphous Carbon Nitride Thin Films Deposited By Glow Discharge
Author: Champi A.
Lacerda R.G.
Marques F.C.
Abstract: The thermal expansion coefficient of a-CNx:H thin films was determined by the thermally induced bending technique. The films were deposited by glow discharge under methane and nitrogen atmosphere, and analyzed by FTIR and Raman spectroscopies, nanohardness, and stress measurements. Drastic changes of the film structure were observed as a result of the nitrogen incorporation, from 0 to 7%. The increase of nitrogen concentration reduces the deposition rate, stress, hardness, and the elastic constant of the films. It was also observed that the thermal expansion coefficient has a significant increase from approximately 2-9×10-6/K, which was associated with the increase in the sp2 concentration induced by the N incorporation, and with the increase in the concentration of C-N bonds. In spite of that, stable and thick (∼ 2 μm) films were deposited at moderate deposition rate (0.3 nm/s), relatively high hardness (13 GPa), and low stress (0.6 GPa). © 2002 Elsevier Science B.V. All rights reserved.
Editor: 
Rights: fechado
Identifier DOI: 10.1016/S0040-6090(02)00797-6
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-17944384540&partnerID=40&md5=66ef04a2a45b303d11dcb009a01182b9
Date Issue: 2002
Appears in Collections:Unicamp - Artigos e Outros Documentos

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