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|Type:||Artigo de evento|
|Title:||Noise Reduction In The Recording Of Holographic Masks In Photoresist|
Soares Leandro L.
Rigon Elso L.
Alves Marco A.R.
Braga Edmundo S.
|Abstract:||The lithography of gratings or structures using photoresist holographic masks is very critical, in particular when high selectivity etching processes were employed. In this paper we study the effect of the mask profile and of the phase perturbations during the holographic exposure in the noise of the photoresist masks. It is shown that the use of appropriate conditions of development and exposure may reduce significantly this noise allowing the recording of high aspect ratio structures and the use of selective deposition techniques.|
|Editor:||Society of Photo-Optical Instrumentation Engineers, Bellingham, WA, United States|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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