Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/101218
Type: Artigo de evento
Title: Noise Reduction In The Recording Of Holographic Masks In Photoresist
Author: Cescato Lucila
Soares Leandro L.
Rigon Elso L.
Alves Marco A.R.
Braga Edmundo S.
Abstract: The lithography of gratings or structures using photoresist holographic masks is very critical, in particular when high selectivity etching processes were employed. In this paper we study the effect of the mask profile and of the phase perturbations during the holographic exposure in the noise of the photoresist masks. It is shown that the use of appropriate conditions of development and exposure may reduce significantly this noise allowing the recording of high aspect ratio structures and the use of selective deposition techniques.
Editor: Society of Photo-Optical Instrumentation Engineers, Bellingham, WA, United States
Rights: aberto
Identifier DOI: 
Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0033319905&partnerID=40&md5=5409e2512fbb0e7175f617c51ed0f088
Date Issue: 1999
Appears in Collections:Unicamp - Artigos e Outros Documentos

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