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|Type:||Artigo de periódico|
|Title:||Hard A-c:h Films Deposited At High Deposition Rates|
De Lima Jr. M.M.
|Abstract:||In this work, we present hard-hydrogenated amorphous carbon films at high deposition rate. The films were prepared on the cathode electrode of a conventional r.f. sputtering system. Hydrogenated amorphous carbon films with excellent properties, i.e, high hardness (15 GPa), relatively low stress (∼1.3 GPa) and with a very high deposition rate (∼0.7 nm/s) were obtained at the conditions of high bias (-800 V) and high methane gas pressure (0.12 × 10-1 mbar). The low band gap and the high ID/IG Raman ratio indicate that the films have high amount of sp2 sites. © 1999 Elsevier Science S.A. All rights reserved.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
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