Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/100854
Type: Artigo de periódico
Title: Hard A-c:h Films Deposited At High Deposition Rates
Author: Marques F.C.
Lacerda R.G.
De Lima Jr. M.M.
Vilcarromero J.
Abstract: In this work, we present hard-hydrogenated amorphous carbon films at high deposition rate. The films were prepared on the cathode electrode of a conventional r.f. sputtering system. Hydrogenated amorphous carbon films with excellent properties, i.e, high hardness (15 GPa), relatively low stress (∼1.3 GPa) and with a very high deposition rate (∼0.7 nm/s) were obtained at the conditions of high bias (-800 V) and high methane gas pressure (0.12 × 10-1 mbar). The low band gap and the high ID/IG Raman ratio indicate that the films have high amount of sp2 sites. © 1999 Elsevier Science S.A. All rights reserved.
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Rights: fechado
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Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0032650292&partnerID=40&md5=2dea98864200c4254fea09463f505c21
Date Issue: 1999
Appears in Collections:Unicamp - Artigos e Outros Documentos

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