Please use this identifier to cite or link to this item: http://repositorio.unicamp.br/jspui/handle/REPOSIP/100722
Type: Artigo de periódico
Title: Optical Emission End Point Detecting For Monitoring Oxygen Plasma A-c:h Stripping
Author: Alves M.A.R.
Da Silva Braga E.
Fissore A.
Cescato L.
Abstract: The stripping of amorphous hydrogenated carbon films (a-C:H) using an rf oxygen plasma has been monitored using the optical emission from electronically excited CO, H and O species in the visible region of the spectrum. The end point has been detected by monitoring the emission intensity of O reactive species (777.2 nm) and CO emission (483.5 nm) intensity of the etching product. © 1998 Elsevier Science Ltd. All rights reserved.
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Rights: fechado
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Address: http://www.scopus.com/inward/record.url?eid=2-s2.0-0000816313&partnerID=40&md5=af04543b2248820c591c30b2001bdd7d
Date Issue: 1998
Appears in Collections:Unicamp - Artigos e Outros Documentos

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