Please use this identifier to cite or link to this item:
|Type:||Artigo de periódico|
|Title:||Etch Channel Elimination In Synthetic Quartz By Electrodiffusion Process|
|Abstract:||The generation of channels in synthetic quartz by chemical etching is an undesirable effect for technological applications. These etch channels can be suppressed by electrodiffusion (sweeping) processing of specific ions by the application of a high electric field at temperatures below 570°C In the present paper we report the study on the operational parameters of the electrodiffusion process for the suppression of etch channels opened by the action of hydrofluoric acid in Z bars of synthetic quartz. The efficiency to inhibit etch channel formation was evaluated by measuring the density of such channels in samples treated in HF 48% solution for 24 h.|
|Appears in Collections:||Unicamp - Artigos e Outros Documentos|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.