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Type: Artigo de periódico
Title: A Study Of The Chemical Bonding And Microstructure Of Ion Beam-deposited Cnx Films Including An Xps C 1s Peak Simulation
Author: Baker M.A.
Hammer P.
Abstract: The chemical bonding and microstructure of dual ion beam-deposited CNx films with nitrogen contents in the range 20-33 at.% have been examined by Fourier transform infrared spectroscopy (FTIR) and x-ray photoelectron spectroscopy (XPS). The FTIR spectra together with other published data have been used to construct a model microstructure of the CNx films. The XPS N 1s peak is composed of two components corresponding to N-sp2 C and N-sp3 C bonds. Using the quantified N Is data and making certain assumptions, the model microstructure has been used as the basis of a C 1s peak simulation in which nine C components have been combined. At an N content of 20 at.% the simulation agrees well with the experimentally recorded XPS C 1s peak. The FTIR spectra, XPS N Is peak shape and C 1s peak simulations support a microstructure of N substitution into an amorphous sp2/sp3 hybridized carbon structure. Above an N content of ∼20%, a new (nitrile-like) chemical form also emerges in the material, its abundance increasing with N content. It is proposed that this new structure occurs due to the presence, in the surface region of the condensing film, of C ≡ N dimers, which are formed when a C atom is surrounded by many N atoms. This molecule becomes trapped in the material and bonds to atoms at neighbouring sites. © 1997 by John Wiley & Sons, Ltd.
Rights: fechado
Identifier DOI: 
Date Issue: 1997
Appears in Collections:Unicamp - Artigos e Outros Documentos

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