Browsing by Subject Chemical vapor deposition

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Showing results 1 to 4 of 4
PreviewIssue DateTitleAuthor(s)AdvisorType
2018Unraveling the atomic structure of Fe intercalated under graphene on Ir(111): a multitechnique approachFerreira, Rodrigo Cezar de Campos; Lima, Luis Henrique de; Barreto, Lucas; Silva, Caio C.; Landers, Richard; Siervo, Abner de-Artigo
2018Influence of deposition conditions on the characteristics of luminescent silicon carbonitride thin filmsKhatami, Z.; Bosco, G. B. F.; Wojcik, J.; Tessler, L. R.; Mascher, P.-Artigo
2011Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growthJin, C; Delmas, M; Aubert, P; Alvarez, F; Minea, T; Hugon, MC; Bouchet-Fabre, B-Artigo de periódico
2017Characterization of PECVD a-C:H:Si:O:Cl filmsRossi, D.; Landers, R.; Bortoleto, J. R. R.; Durrant, S. F.-Artigo
Showing results 1 to 4 of 4