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Browsing by Author Swart, JW
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Showing results 1 to 20 of 21
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Issue Date
Title
Author(s)
Advisor
Type
2003
Silicon nitride etching in high- and low-density plasmas using SF(6)/O(2)/N(2) mixtures
Reyes-Betanzo, C
;
Moshkalyov, SA
;
Swart, JW
;
Ramos, ACS
-
Artigo de periódico
2002
Study of conditions for anisotropic plasma etching of tungsten and tungsten nitride using SF6/Ar gas mixtures
Reyes-Betanzo, C
;
Moshkalyov, SA
;
Ramos, AC
;
Diniz, JA
;
Swart, JW
-
Artigo de periódico
2008
Controlled Deposition and Electrical Characterization of Multi-Wall Carbon Nanotubes
Moshkalev, SA
;
Leon, J
;
Verissimo, C
;
Vaz, AR
;
Flacker, A
;
de Moraes, MB
;
Swart, JW
-
Artigo de periódico
2006
Efficacy of ECR-CVD silicon nitride passivation in InGaP/GaAs HBTs
Zoccal, LB
;
Diniz, JA
;
Doi, I
;
Swart, JW
;
Daltrini, AM
;
Moshkalyov, SA
-
Artigo de periódico
2007
Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix
Mestanza, SNM
;
Doi, I
;
Swart, JW
;
Frateschi, NC
-
Artigo de periódico
2009
Fabrication of high-aspect ratio silicon nanopillars and nanocones using deep reactive ion etching
Fischer, C
;
Menezes, JW
;
Moshkalev, SA
;
Verissimo, C
;
Vaz, AR
;
Swart, JW
-
Artigo de periódico
2008
Characterization of Silicon Rich Oxides with Tunable Optical Band Gap on Sapphire Substrates by Photoluminescence, UV/Vis and Raman Spectroscopy
Kiebach, R
;
Luna-Lopez, JA
;
Dias, GO
;
Aceves-Mijares, M
;
Swart, JW
-
Artigo de periódico
1998
Education on microfabrication in Latin America and the microelectronics workshop at UNICAMP
Swart, JW
-
Artigo de periódico
1999
Influence of the substrate thickness and radio frequency on the deposition rate of amorphous hydrogenated carbon a-C : H films
Balachova, OV
;
Alves, MAR
;
Swart, JW
;
Braga, ES
;
Cescato, L
-
Artigo de periódico
2004
Anisotropic etching of silicon for a micromachining application using plasmas of SF6/CH4/O-2/Ar and SF6/CF4/O-2/Ar
Reyes-Betanzo, C
;
Moshkalyov, SA
;
Swart, JW
-
Artigo de periódico
2008
Layout techniques for radiation hardening of standard CMOS active pixel sensors
Braga, LHC
;
Domingues, S
;
Rocha, MF
;
Sa, LB
;
Campos, FS
;
Santos, FV
;
Mesquita, AC
;
Silva, MV
;
Swart, JW
-
Artigo de periódico
2006
Characterization and modeling of antireflective coatings of SiO2, Si3N4, and SiOxNy deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition
Mestanza, SNM
;
Obrador, MP
;
Rodriguez, E
;
Biasotto, C
;
Doi, I
;
Diniz, JA
;
Swart, JW
-
Artigo de periódico
1996
Rapid thermal annealing of Mg+ and P+ co-implanted GaAs
deSouza, JP
;
Boudinov, H
;
Swart, JW
-
Artigo de periódico
1998
Inductively coupled plasma etching of In-based compound semiconductors in CH4/H-2/Ar
Diniz, JA
;
Swart, JW
;
Jung, KB
;
Hong, J
;
Pearton, SJ
-
Artigo de periódico
2001
Permittivity of amorphous hydrogenated carbon (alpha-C : H) films as a function of thermal annealing
Balachova, OV
;
Swart, JW
;
Braga, ES
;
Cescato, L
-
Artigo de periódico
2013
Photodetection With Gate-Controlled Lateral BJTs from Standard CMOS Technology
Campos, FD
;
Faramarzpour, N
;
Marinov, O
;
Deen, MJ
;
Swart, JW
-
Artigo de periódico
2004
IonRock: software for solving strain gradients of ion-implanted semiconductors by X-ray diffraction measurements and evolutionary programming
Bleicher, L
;
Sasaki, JM
;
Orloski, RV
;
Cardoso, LP
;
Hayashi, MA
;
Swart, JW
-
Artigo de periódico
2000
CF4 plasma etching of materials used in microelectronics manufacturing
Balachova, OV
;
Alves, MAR
;
Swart, JW
;
Braga, ES
;
Cescato, L
-
Artigo de periódico
2000
MSM photodetector with an integrated microlens array for improved optical coupling
Ozelo, HFB
;
de Barros, LEM
;
Nabet, B
;
Neto, LG
;
Romero, MA
;
Ramos, ACS
;
Swart, JW
-
Artigo de periódico
2005
Photoluminescence and the Raman scattering in porous GaSb produced by ion implantation
Danilov, YA
;
Biryukov, AA
;
Goncalves, JL
;
Swart, JW
;
Iikawa, F
;
Teschke, O
-
Artigo de periódico