Browsing by Author Schürmann, M.

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Showing results 1 to 6 of 6
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2010Solving the thermal stability problem at the HfO2 /Si interface with previous N implantationCarazzolle, M. F.; Flüchter, C. R.; Siervo, A. de; Pancotti, A.; Weier, D.; Schürmann, M.; Westphal, C.; Landers, R.; Kleiman, G. G.-Artigo
2006Hafnium silicide formation on Si(100) upon annealingSiervo, A. de; Flüchter, C. R.; Weier, D.; Schürmann, M.; Dreiner, S.; Westphal, C.; Carazzolle, M. F.; Pancotti, A.; Landers, R.; Kleiman, G. G.-Artigo
2008Structure determination of three-dimensional hafnium silicide nano structures on Si(100) by means of X-ray photoelectron diffractionFlüchter, C. R.; Siervo, A. de; Weier, D.; Schürmann, M.; Beimborn, A.; Dreiner, S.; Carazzolle, M. F.; Landers, R.; Kleiman, G. G.; Westphal, C.-Artigo
2007Photoelectron diffraction study and structure determination of ultrathin hafnium silicide layers on silicon(100) using Mg Kα radiation and synchrotron lightFlüchter, C. R.; Siervo, A. de; Weier, D.; Schürmann, M.; Berges, U.; Dreiner, S.; Carazzolle, M. F.; Landers, R.; Kleiman, G. G.; Westphal, C.-Artigo
2006Structure analysis of the system hafnium/silicon(100) by means of X-ray photoelectron spectroscopy and X-ray photoelectron diffraction (XPD)Flüchter, C. R.; Siervo, A. de; Weier, D.; Schürmann, M.; Berges, U.; Dreiner, S.; Carazzolle, M. F.; Landers, R.; Kleiman, G. G.; Westphal, C.-Artigo
2006Photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) studies on the system hafnium silicide and hafnium oxide on Si(1 0 0)Weiera, D.; Flüchtera, C.; Siervo, A. de; Schürmann, M.; Dreiner, S.; Berges, U.; Carazzolle, M. F.; Pancotti, A.; Landers, R.; Kleiman, G. G.; Westphal, C.-Artigo